INSTALLATION FOR MODIFYING THE SURFACE OF POLYMER FILMS IN LOW-TEMPERATURE PLASMA OF SLIDING DISCHARGE AT ATMOSPHERIC PRESSURE Russian patent published in 2022 - IPC B29C71/00 H01J37/00 

FIELD: polymer films.

SUBSTANCE: invention relates to a plant for modifying the surface of polymer films. The effect is achieved by a device for modifying the surface of polymer films in a low-temperature plasma of a sliding discharge of atmospheric pressure, which contains a high-voltage power source, a reaction gas puffing system, an ejector, and electrodes. At the same time, the electrodes in the setup are equipped with seed protrusions. Wherein by changing the position of the hinged tube connected to the reaction gas inlet system, it is possible to control the position of the deflector relative to the plane of the electrodes and the angle of attack of the reaction gas flow α of the deflector with a change in the area and degree of modification of the polymer film surface. In this case, the angle of attack of the reaction gas flow α of the diverter is 115-160° to achieve a uniform plasma flow and modify the surface of the polymer film.

EFFECT: regulation of the area, degree and achievement of uniform modification without changing the physical-mechanical and dielectric properties of the surface of the modified polymer films.

1 cl, 5 dwg