METHOD FOR VACUUM ION-PLASMA DEPOSITION OF A THIN FILM OF SOLID ELECTROLYTE Russian patent published in 2022 - IPC C23C16/30 C23C16/509 C23C16/513 C23C16/54 

FIELD: vacuum ion-plasma deposition.

SUBSTANCE: invention relates to a method for vacuum ion-plasma deposition of a thin amorphous film of phosphorus-lithium oxynitride LiPON on a substrate. Heating, melting, evaporation of lithium orthophosphate Li₃PO₄ and the formation of a film on the surface of the substrate in the plasma of a low-pressure discharge with a self-heated hollow cathode and an anode consisting of two parts are carried out. One part of the anode is the anode-crucible, inside which the powder of the evaporated substance Li₃PO₄ is placed and evaporated at a rate controlled by the change in the current in the anode-crucible circuit. The second part of the anode is a hollow ionizer electrode. The density of the generated plasma is controlled by changing the value of the current in the circuit of the ionizer electrode. Li₃PO₄ is evaporated in a closed crucible anode with a 6 mm hole in the lid for vapor flow. Reactive nitrogen is supplied through the hollow ionizer electrode and the current in the electrode circuit is increased above the threshold value of 30 A, at which an amorphous LiPON film with high ionic conductivity is formed. A LiPON film is formed on the surface of a substrate having a floating potential and a temperature below 200°C. After reaching the required film thickness, the discharge is turned off, and the inlet of reactive nitrogen into the reaction volume is blocked. Then, in a vacuum not exceeding 0.01 Pa, stabilizing annealing is carried out by heating the formed LiPON film to a temperature of 250°C and holding at this temperature for 2 hours.

EFFECT: increased deposition rate of solid electrolyte film from phosphorus-lithium oxynitride LiPON.

1 cl, 3 dwg