FIELD: etching.
SUBSTANCE: group of inventions is related to a method and device for etching a workpiece having a flat surface with an edge part, which can be used in various fields of technology, in particular, in the fields of semiconductor and optical devices and metalworking. The method and device for etching a workpiece can be used for etching flat surfaces of workpieces with active structures that are particularly sensitive to the action of the etchant.
EFFECT: formation of an even round contour or edge of a flat surface layer of material in the workpiece is ensured with a decrease in the consumption of a neutral liquid substance and an etchant and with an increase in the etching rate.
3 cl, 4 dwg
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