DEVICE AND METHOD FOR PROCESSING LIQUID MEDIUM Russian patent published in 2023 - IPC C02F1/46 B01J19/08 

FIELD: electrochemistry.

SUBSTANCE: complex processing of a liquid medium flow without the use of chemical reagents. The liquid medium processing device contains a chamber in which an inlet diaphragm, a rod electrode, a control electrode and a ring electrode are arranged in series. The electrodes are made with the possibility of forming a plasma that evenly and completely occupies the body volume between the rod electrode and the annular electrode. The liquid medium supply pipe is installed on the side of the inlet diaphragm, which is configured to provide a pressure jump at the inlet to the plasma region and thereby form a two-phase flow, including the liquid phase and the vapor phase. The device contains a diffuser installed on the side of the chamber, opposite to the location of the liquid medium inlet pipe, in which, by means of valves, a pressure is created higher than in the chamber, to ensure the condensation of the vapor phase of the two-phase flow. Behind the diffuser at the exit from the chamber there is a discharge branch pipe. The device contains an alternating voltage generator for supplying voltage to the rod electrode and the ring electrode and a control voltage generator for supplying voltage to the control electrode. The treatment of the liquid medium is carried out using the device described above. Ensure the flow of a liquid medium. A supersonic two-phase flow of a liquid medium is formed and processed in a plasma discharge. Carry out the increase in pressure in the treated two-phase flow of the liquid medium to ensure the condensation of the vapor phase. Provide complete coverage of the two-phase flow of the liquid medium by the plasma discharge.

EFFECT: increasing the efficiency of processing a liquid medium, in particular, by essentially complete coverage of the volume of the treated medium with a homogeneous plasma in the area of its plasma treatment with the possibility of controlling the plasma parameters to select the most optimal processing mode and the possibility of processing various liquid media.

6 cl, 2 dwg