FIELD: microelectronics.
SUBSTANCE: invention relates to microelectronics and is intended for making microelectronic products with resolution of up to 150 mcm on a flexible metal or polymer substrate. Complex for production of microelectronic products on flexible substrates comprises installation for vacuum sputtering of PVD coating on surface of flexible substrate, installation for lamination of substrate with dry film photoresist, an exposure installation for forming a pattern on the surface of a dry film photoresist using photomasks, installation for developing the exposed photoresist, etching installation and photoresist removal installation, wherein said installations are equipped with film rewinding devices to position the film and to control its tension, which are equipped with winding and unwinding shafts that can be rotated by servo drives.
EFFECT: high quality of the obtained microelectronic products and high efficiency of the process of producing microelectronic products.
2 cl, 6 dwg
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