ION SOURCE Russian patent published in 2021 - IPC H01J27/16 H01J37/08 

FIELD: plasma engineering.

SUBSTANCE: invention relates to plasma technology. The ion source contains an axisymmetric gas-discharge chamber made of a dielectric material permeable to electromagnetic radiation. The chamber includes two successively coupled sections, the first of which is located on the side of the inlet pipe of the gaseous working substance and has a cylindrical shape. The second section is coupled to the output part of the first section and is made tapering in the direction of extraction and acceleration of ions in the form of a truncated cone of rotation. The energy input unit is made in the form of a curved conductor, the sections of which form turns located on the outside of the first section of the chamber, and is connected to the output of a high-frequency voltage generator. The ion extraction and acceleration system includes two electrodes, one of which is located on the side of the first section of the chamber. The second electrode has an annular shape and is installed coaxially to the gas discharge chamber from the side of its second section. On the outside of the gas discharge chamber, an electromagnetic coil is installed between the energy input node and the output of the second section.

EFFECT: longer service life, increased reliability and simplified design of the ion source.

9 cl, 4 dwg