PLASMA REACTOR AND PLASMA GENERATING DEVICE (ALTERNATIVES) Russian patent published in 2003 - IPC

Abstract RU 2196395 C1

FIELD: plasma engineering and material treatment. SUBSTANCE: plasma reactor has discharge chamber, material treatment chamber, magnetic system producing stationary heterogeneous magnetic field in chamber space, and double-section high-frequency energy lead-in assembly. First alternative of reactor design has its first section made in the form of series-connected conductor lengths disposed on external side of discharge-chamber insulating wall. Current flows through two opposing conductor lengths in opposite directions. Second section is made in the form of spiral conductor placed on external side of discharge chamber, on one or more of its insulating walls. First section is mounted above central part of discharge chamber and second one, around first section. Second alternative of reactor design has first section of high- frequency lead-in assembly made in the form of spiral conductor whose turns are disposed on external side of discharge-chamber insulating wall. First and second sections are made in the form of opposing-lay spirals, first section being installed above central part of discharge chamber and second one, round first section. EFFECT: generation of dense plasma regions spatially uniform in concentration for uniform material treatment. 32 cl, 6 dwg

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RU 2 196 395 C1

Authors

Aleksandrov A.F.

Bugrov G.Eh.

Vavilin K.V.

Kondranin S.G.

Kral'Kina E.A.

Pavlov V.B.

Rukhadze A.A.

Dates

2003-01-10Published

2001-05-30Filed