FIELD: various technological processes.
SUBSTANCE: invention relates to an evaporation device for vacuum production of a thin-film coating from a material whose evaporation temperature or sublimation temperature is 150–1500 °C, and a method of producing said coating. Above device contains an evaporation cell, which includes heating facilities and a crucible, characterized by the presence of an upper open end and a lower dead bottom for placing on it the loaded material to be evaporated or sublimated. Heating means are configured to heat said crucible to temperature in range of 150 to 1500 °C and creating a material flow in vapor phase by evaporation or sublimation of the loaded material. Evaporation device additionally includes a filtering insert designed to be placed on the upper open end of the crucible, and a lower part comprising, if viewed from top to bottom, a plate, which is provided with at least one hole, and one screen. Lower part is intended for installation in the crucible between the upper part and the loaded material. Said method is carried out using said device.
EFFECT: improved uniformity and homogeneity of deposition of thin-film coatings on a substrate.
11 cl, 6 dwg, 1 ex
