FIELD: chemistry.
SUBSTANCE: invention relates to a method of producing coating semiconductor materials via chemical deposition from vapour phase. The method of depositing a coating onto a glass substrate heated to 585-650°C at atmospheric pressure comprises the following operations: mixing the controlled mass of semiconductor material and a stream of hot inert gas; evaporating the semiconductor material in the stream of hot inert gas in order to obtain a fluid mixture at 800-1100°C; directing the fluid mixture at virtually atmospheric pressure onto a substrate, having a transparent, electroconducting coating; depositing a layer of the semiconductor material onto the surface of the substrate. The semiconductor material used is cadmium sulphide or cadmium telluride.
EFFECT: low cost of making photovoltaic panels.
14 cl, 3 dwg
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