FIELD: plasma equipment.
SUBSTANCE: invention relates to plasma engineering and can be used in process plasma sources used for ion-plasma treatment of surfaces of various materials in vacuum. Gas isolation comprises a dielectric inlet plate with an inlet hole and a dielectric outlet plate with an outlet hole, connected to each other by an electrically conductive connecting spacer. Plates are in direct contact with each other without an electroconductive connecting spacer, and at the point of contact on the plates there are grooves forming channels perpendicular to the inlet hole and connected to the outlet holes.
EFFECT: reduced overall dimensions of the device and reduced probability of electric breakdown.
2 cl, 1 dwg
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