TARGET MATERIAL, HIGH-BRIGHTNESS EUV SOURCE AND 13.5 NM RADIATION GENERATION METHOD Russian patent published in 2023 - IPC H01J35/02 

FIELD: Li-containing target material.

SUBSTANCE: invention relates to a Li-containing target material designed to produce emitting plasma in high-brightness light sources and to generate radiation in the extreme ultraviolet (EUV) region at a wavelength of 13.5 nm. A eutectic Li alloy with an additional element is used as the target material, which allows the target material density to be increased many times that of Li at an atomic fraction of 90% to 60%. The additional element is selected from the group that includes Au, Ag, Bi, Ba, Sr. The target material is used in a laser plasma-based EUV source with a fast rotating target (at least 100 m/s), in which the contaminant droplet fraction is not directed into the spatial regions of laser and EUV beam paths.

EFFECT: expanding the range of applications of compact clean radiation sources with high spectral brightness by 13.5 nm due to a sharp decrease in the velocity of the droplet fraction of polluting particles and the ability to control the direction of its departure from the Li-containing plasma due to the high target velocity.

16 cl, 7 dwg