DEVICE WITH PROTECTIVE COVERS FOR LIQUID CHEMICAL TREATMENT OF SEMICONDUCTOR WAFERS AND SUBSTRATES Russian patent published in 2025 - IPC H01L21/306 H01L21/67 

FIELD: performing operations.

SUBSTANCE: invention can be used in electronic industry for high-quality surface cleaning in production of IC, LSI and VLSI. In a device with protective covers for liquid chemical treatment of semiconductor wafers and substrates, comprising a bath with a treatment zone, left and right covers movably connected to the bath in its upper part by means of attachment points, the inner surface of each cover faces the processing zone, and the outer surface faces from the processing zone, the outer surface of the covers is made skewed in opposite directions from the point of their closure and is equipped with handles for opening and closing; besides, on the inner surface of the covers there is a recess for condensate collection, and at the point of closing the covers there is a gap for compensation of thermal expansion, besides, the outer surface of the left cover has a projection covering the gap for compensation of thermal expansion.

EFFECT: high quality of processing semiconductor wafers and washing the device itself, reducing consumption of processing chemicals, ensuring safety and environmental friendliness of the working process, as well as simplifying maintenance of the device.

2 cl, 9 dwg