METHOD AND DEVICE FOR WASHING AND DRYING FLAT GLASS SUBSTRATES Russian patent published in 2007 - IPC H01L21/306 

Abstract RU 2309481 C2

FIELD: electronic engineering; group treatment of flat glass substrates.

SUBSTANCE: proposed method for washing and drying flat glass substrates includes following operations: substrate held in magazine is placed in washing bath filled with deionized water, washed out, and then slowly taken out of magazine; while substrates are being taken out of water, they are washed and dried out in nitrogen and organic solvent vapors; upon such treatment substrates are secured in extreme upper position, whereupon magazine is moved up, washed, and dried in the same way as substrates; treated substrates are placed in extreme upper position into magazine and the latter is then removed together with substrates from drying chamber. Device implementing proposed method is also given in invention specification.

EFFECT: enhanced quality of substrate treatment; ability of process automation in flexible production line; simplified design.

2 cl 5 dwg

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RU 2 309 481 C2

Authors

Zavalishin Aleksandr Aleksandrovich

Nagumanov Makh'Jan Lukmanovich

Bykova Ljudmila Julianovna

Dates

2007-10-27Published

2005-07-27Filed