INSTALLATION FOR INDIVIDUAL CHEMICAL TREATMENT OF SUBSTRATES Russian patent published in 2023 - IPC B05C5/02 H01L21/67 

FIELD: electronic industry.

SUBSTANCE: invention relates to devices for liquid chemical cleaning of the surface of products and can be used mainly in the electronics industry for deep high-quality and safe cleaning of the surface of semiconductor substrates in the manufacture of ICs, LSI and VLSI in an automatic cluster line or in an installation for individual chemical processing of substrates. The device for individual chemical processing of substrates contains a bath installed in the chamber with nozzles for spraying reagents, channels for supplying deionized water and nitrogen, a substrate positioning device for controlling the fixation and rotation of the substrate, a vertical movement mechanism, a rotary drive with a centrifuge fixed on it, the inner part of which is closed casing, while the centrifuge contains a substrate positioning device to control the fixation and rotation of the substrate, which is moved by pneumatic actuators. The positioning device consists of a drive that transmits the torque to the rotor, on the rotating part of which four clamps with four springs are installed. The bath installed in the chamber contains a drain channel and exhaust manifolds for pumping out spent chemicals.

EFFECT: improved operational characteristics, significant improvement in the quality of semiconductor substrate cleaning during liquid chemical processing, reduced consumption of processing chemicals, as well as ensuring the safety and environmental friendliness of the work process.

1 cl, 6 dwg