FIELD: chemistry.
SUBSTANCE: surface of semiconductor plates is cleaned in a bath with a detergent bifluoride solution activated with concentrated nitrogen and ultrasound at room temperature, followed by washing with dionised water.
EFFECT: highly efficient, resource- and energy-saving, ecologically clean and safe method of cleaning the surface of semiconductor plates from organic and metallic contaminants and shorter time for treating the plates.
2 cl, 1 dwg
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