METHOD FOR CONTINUOUS CHEMICAL LIQUID CLEANING OF SURFACES OF PRIMARILY SEMICONDUCTOR PLATES Russian patent published in 1998 - IPC

FIELD: electronic industry. SUBSTANCE: method involving electrochemical activation of sulfuric acid solution, treatment of plate surface with activation solution, plate rinsing and drying, repeated treatment and cleaning of solution is characterized in that sulfuric acid used for the purpose has concentration of 12 to 15 M, treatment is conducted at voltage across electrodes between 5.0 and 5.5 V at anode current density between 5.0 and 5.5 kA/sq. m. EFFECT: improved cleaning efficiency and provision for complete reconditioning of etching solution. 2 cl, 9 dwg, 2 tbl