PLASMA IGNITION DEVICE IN HIGH-FREQUENCY PLASMA SOURCE Russian patent published in 2025 - IPC F02P9/00 H05H1/24 H05H1/46 

FIELD: plasma equipment.

SUBSTANCE: invention relates to plasma engineering, in particular to a method of igniting a discharge in a high-frequency (HF) plasma source, which creates a plasma emitter in ion sources of atomic beam injectors. On the rear flange of the plasma chamber in the centre there is a plasma ignition device combined with a gas inlet. Device does not protrude beyond the plane of the flange inside the plasma chamber. Working gas is supplied to the plasma chamber through an electromagnetic pulse valve installed on the housing of the device. Gas from the valve passes in the channel inside the cathode molybdenum electrode, then through two radial holes it enters the gap between the electrode and the ceramic insulator in the form of a tube. Further, it passes through two slots in the electrode, having in this place a diameter equal to the inner diameter of the ceramic tube, and falls into the area of the ignition discharge along the inner surface of the ceramic tube. Valve is galvanically isolated by potential from ignition body by means of insulators. Discharge between the cathode and the molybdenum anode is initiated by applying a high voltage pulse of up to ~3 kV between the housing of the device connected to the anode and the housing of the valve connected to the cathode electrode. Negative potential is supplied to the cathode.

EFFECT: increasing the duration of operation of the plasma source to tens of seconds and more, without destroying the cathode part of the plasma ignition device.

1 cl, 5 dwg