PRECURSORS AND IMPURITIES CONVERSION PRODUCTS IN PLASMA CHEMICAL REACTORS MONITORING METHOD Russian patent published in 2025 - IPC G01N27/68 

FIELD: measuring.

SUBSTANCE: invention relates to methods of monitoring products of conversion of precursors and impurities in plasma-chemical reactors and enables qualitative and quantitative analysis of products of conversion of precursor impurities in conditions of plasma-chemical synthesis of nanostructures, thin films and etching. Method of controlling conversion products of precursors and impurities in plasma chemical reactors comprises energy spectrum of electrons formed as a result of Penning ionisation of atoms and molecules of conversion products of an impurity gas by metastable atoms of a buffer inert gas is measured using a measuring probe to which a time-varying retarding electric potential is applied. Simultaneously with applying the potential, the current-voltage characteristic is measured and double differentiation of the current-voltage characteristic is carried out, through which the energy spectrum of electrons can be obtained. By calibrating the spectrum, qualitative and quantitative analysis of the conversion products of the impurity gas is carried out.

EFFECT: possibility of local determination of concentration of precursor conversion products and impurities in plasma chemical reactors, as well as high accuracy of determining absolute values of concentrations.

3 cl, 3 dwg