FIELD: microelectronics. SUBSTANCE: essence of this method resides in that integrated circuit connections are bonded by applying bonding material based on aluminum and its alloys added with 0.1 to 1.0 % titanium in vacuum interlock plant at pressure of ρ1 in working chamber and pressure of 10-1-9,6·10-1) in common chamber, content of active gaseous impurities in plasma discharge medium not exceeding ~1,33·10-3Pa. EFFECT: higher yield of sound integrated circuits due to prevention of extra growth of O2 ·10-6Pa,N210-5Pa,CnHm 1,5·10-7 AITI/AITISI films and migration of electrons. 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| SPRAYED TARGETS OF HIGHLY PURE ALLOYS ON BASIS OF TRANSITION METALS AND METHOD OF THEIR PRODUCTION | 2009 |
|
RU2392685C1 |
| METHOD OF PRODUCTION OF MULTI-LAYER GRADIENT COATING BY METHOD OF MAGNETRON DEPOSITION | 2013 |
|
RU2551331C2 |
| METHOD TO PRODUCE NANOCRYSTALLINE FILMS OF RUTILE | 2010 |
|
RU2436727C2 |
| METHOD FOR APPLYING METAL COATING FROM MATERIAL SUBJECT TO ACTIVE OXIDATION IN AIR ATMOSPHERE, AND DEVICE FOR ITS IMPLEMENTATION | 2021 |
|
RU2757882C1 |
| METHOD FOR APPLICATION OF ELECTROCONDUCTIVE COATING FOR ELECTRICALLY-HEATED ORGANIC GLASS ELEMENT | 2014 |
|
RU2564650C1 |
| METHOD FOR CREATING QUANTUM DOTS FOR ELEMENT BASE OF RADIO ENGINEERING | 2020 |
|
RU2753399C1 |
| METHOD AND APPARATUS FOR PRODUCING BERYLLIUM OR BERYLLIUM-CONTAINING FOIL | 2000 |
|
RU2194087C2 |
| METHOD TO MANUFACTURE THIN-FILM NANO AND MICROELECTROMECHANICAL SYSTEM OF HIGH TEMPERATURE SENSOR OF MECHANICAL VALUES | 2014 |
|
RU2547291C1 |
| FACILITY FOR APPLYING THIN-FILM COATINGS | 1997 |
|
RU2138094C1 |
| METHOD OF MANUFACTURING OF THIN FILM NANO- AND MICROELECTROMECHANICAL SYSTEM OF MECHANICAL VALUES TRANSMITTER | 2013 |
|
RU2544864C1 |
