METHOD FOR APPLYING METAL COATING FROM MATERIAL SUBJECT TO ACTIVE OXIDATION IN AIR ATMOSPHERE, AND DEVICE FOR ITS IMPLEMENTATION Russian patent published in 2021 - IPC C23C14/14 C23C14/35 C23C14/54 C23C14/56 

FIELD: material engineering.

SUBSTANCE: group of inventions relates to the technology of thin films and is intended for the production of coatings from materials that can be used in the study of the properties of materials subject to active oxidation in the air atmosphere, namely, obtaining data on a pure material with a minimum oxygen content. The method for applying a metal coating from a material subject to active oxidation in the air atmosphere includes loading the substrate into the volume of the working chamber, vacuuming it, letting an inert gas into the working chamber and obtaining a metal coating by ion-plasma sputtering of disk targets in an inert gas medium, followed by deposition on the substrate in the form of a film, while the working chamber is integrated into the volume of the glove box with the provision of a controlled inert atmosphere in the volume of the glove box, first, the substrate is loaded into the volume of the glove box through a vacuum lock with the possibility of letting the inert atmosphere of the box into the lock and achieving the same pressure, and from there it is moved to the working chamber located inside the volume of the box, the volume of the working chamber is evacuated, the inert gas is let into the volume of the working chamber in the pressure range from 1⋅10^-3 до 3⋅10^-3 torr, the substrate is rotated, the substrate is cleaned with inert gas ions, the substrate is rotated and placed parallel to the device spraying of disk targets, and the process of applying a metal coating to the substrate is carried out by ion-plasma sputtering of the corresponding disk target, while at all stages the flow of water and oxygen vapors into the volume of the working chamber and the glove box is monitored. The method is carried out in a device containing a working chamber and a glove box, at least one disk target atomization device 10, an ion source 9, a substrate holder 11 and a system for moving and rotating the substrate holder 12 are installed in the working chamber, while the working chamber is integrated into the volume of the glove box, the disk target atomization device 10 and the ion source 9 are installed on a platform that sets their mutual confocal orientation, namely, focusing the axes on a common focal plane in which the substrate is located, in this case, the ion source 9 is located coaxially with the substrate holder 11, and the disk target atomization device 10 is at an angle to the “ion source - substrate holder” axis, the system for moving and rotating the substrate holder 12 is made with the possibility of rotating the substrate at a controlled speed relative to the axes of the disk target atomization device 10 and the ion source 9 and installing the substrate in a plane perpendicular to the axis of the disk target atomization device, or to the axis of the ion source.

EFFECT: production of a coating in the form of a film with characteristic thicknesses from units to tens of microns, from a material that is actively oxidized in an air atmosphere with a minimum oxygen content, as well as an increase in the adhesive ability of the resulting coating to the substrate surface.

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