FIELD: semiconductor equipment. SUBSTANCE: width of forbidden zone of photosensitive material in direction from illuminated surface Z starts to change at distance corresponding to depth of absorption of 50-80% of Zo radiation from width of forbidden zone applicable to short-wave range Eg1 of operation of photodetector, to width of forbidden zone corresponding to long-wave range Eg2. Gradient of width of forbidden zone in this case meets condition -2Eg1/w2•(1-(Z-Zo)/w2≅ ▿Eg(Z)≅ 0 with Zo≅ Z Zo+w1 and measurement amplitude of width of forbidden zone satisfies condition where ε1, ε2 and w1, w2 are dielectric constants and width of barriers in semiconductors having Eg1 and Eg2 correspondingly. Electrodes of image recording are manufactured from material which lets pass 50-80% of radiation and electrodes of collection and transfer shield photosensitive material from radiation. Collection and transfer electrodes may be shielded from radiation. Collection and transfer electrodes may be shielded from radiation by opaque screen. Photodiodes on the basis of Schottky barrier or p-n junction may be made in vary-zone plate provided that width of region of volumetric charge exceeds values Zo. Photosensitive plate can be fabricated in the form of epitaxial structure. EFFECT: elimination of signal self-elimination, simplification of design of photodetector and increase of its detective capability. 5 cl, 9 dwg
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Authors
Dates
1996-02-20—Published
1991-01-21—Filed