METHOD FOR GENERATION OF FLAT THIN FILMS Russian patent published in 1996 - IPC

Abstract SU 1829760 A1

FIELD: microelectronics. SUBSTANCE: method involves amplitude modulation of frequency, which is not greater than 4 MHz and which corresponds to high-frequency shift, when thin metal film is deposited on substrate by means of sputtering in rarefied noble gas. EFFECT: increased functional capabilities. 1 dwg

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SU 1 829 760 A1

Authors

Dostanko A.P.

Popov S.V.

Baranov V.V.

Popov Ju.P.

Kazachonok G.M.

Dates

1996-03-27—Published

1991-06-28—Filed