APPARATUS FOR OBTAINING THIN FILMS BY ION-PLASMA SPRAYING METHOD Russian patent published in 1995 - IPC

FIELD: production of thin films by ion-plasma spraying. SUBSTANCE: apparatus has housing with working and cathode chambers interconnected through diaphragm with calibrated opening, working gas discharge system, evacuation system, cathode, anode and solenoids positioned in working and cathode chambers in axial alignment with calibrated opening, target holder and rotating substrate holder positioned in parallel with axes of solenoids one opposite the other, with substrate holder being heated by electric heater, low-voltage and high- voltage constant voltage sources connected with anode, cathode, substrate holder and target. Apparatus is further provided with high-frequency voltage sources connected with target holder and substrate holder so that phase shift may occur between them. Diaphragm formed as nozzle is electrically insulated with respect to housing and connected with anode, cathode and earthed through three-position switch. Working gas discharge system is provided with two-stage getter purification system, which may have titanium target magnetron dispersion chamber and cathodic chamber with chambers being connected in series. Cathodic chamber has titanic cathodic screen with opening axially aligned with nozzle. Substrate holder may be water cooled and may be positioned for axial displacement. Anode may be movable along axis. EFFECT: increased efficiency improved quality and increased reproducibility of thin films. 5 cl, 3 dwg