FIELD: chemical metal working. SUBSTANCE: liquid has, wt.-%: nitric acid 1.9-2.1; hydrofluoric acid 0.9-1.1; Petrov's contact 0.10-1.15; water 0.5-0.6, and glycerol 0.7-1.0. Liquid is used for photochemical etching of articles with multiple structure and can be used in electronics. EFFECT: enhanced quality of liquid. 1 tbl
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