FIELD: production of semiconductor devices. SUBSTANCE: planar p-n junction has two conduction regions of different types, p-n junction has a closed configuration. Annular zones of the same conduction are arranged about the internal zone in the form of a spiral connected with the internal zone and developing towards periphery, with the distances between the spiral turns being less than the space charge in the semiconductor surface layer at surface break-down voltage. EFFECT: enhanced quality. 2 cl, 2 dwg
Title | Year | Author | Number |
---|---|---|---|
HIGH-VOLTAGE TRANSISTOR | 1990 |
|
RU1780472C |
METHOD OF MAKING SELF-ALIGNED HIGH-VOLTAGE INTEGRATED TRANSISTOR | 2012 |
|
RU2492546C1 |
HIGH-VOLTAGE BIPOLAR TRANSISTOR | 0 |
|
SU1039413A1 |
SEMICONDUCTOR DEVICE PERIPHERY, NEUTRALISING EFFECT OF CHARGE ON STABILITY OF RETURN LEAKAGE AND BREAKDOWN VOLTAGE | 2008 |
|
RU2379786C1 |
METHOD OF CHECKING THE SURFACE DIELECTRIC LAYERS | 1992 |
|
RU2022290C1 |
HIGH-VOLTAGE SELF-ALIGNED INTEGRATED TRANSISTOR | 2012 |
|
RU2492551C1 |
TRANSISTOR WITH OVERVOLTAGE PROTECTION | 1991 |
|
RU2037237C1 |
HIGH-VOLTAGE SEMICONDUCTOR INSTRUMENT | 2009 |
|
RU2395869C1 |
HIGH-VOLTAGE SELF-ALIGNED INTEGRATED DIODE | 2012 |
|
RU2492552C1 |
SEMICONDUCTOR STRUCTURE | 1990 |
|
RU1699313C |
Authors
Dates
1994-09-15—Published
1991-11-21—Filed