FIELD: measurement technology. SUBSTANCE: electromagnetic radiation flux excites surface electromagnetic wave in metal film placed on surface of semiconductor layer. In this case investigated medium is located in field of propagation of radiation and/or surface electromagnetic wave. Electric signal in circuit between specified film and layer of semiconductor is registered. Parameters of this signal correspond to parameters of medium which are determined by comparison of given signal with test dependences. EFFECT: simplified approach, enhanced authenticity of measurements. 14 cl, 3 dwg
