PLASMA-CHEMICAL REACTOR OF BARREL TYPE Russian patent published in 1994 - IPC

FIELD: microelectronics. SUBSTANCE: plasma-chemical reactor of barrel type includes vacuum discharge chamber formed by cylindrical dielectric body and two grounded metal lids with dielectric coat mounted on its butts acting as electrodes. Collectors to feed and pump out working gas manufactured in the form of longitudinally perforated dielectric pipes passing along walls of body over its entire length are put into chamber through unopened lid. Dielectric ladle with treated plates oriented perpendicular to axis of reactor is loaded into chamber through opened lid. Plates are split into two groups by unfilled spacing located in reactor area embraced with ring HF electrode. Metal plates-simulaters with dielectric coating are positioned at start and finish of each group of plates. Perforation of collectors faces wall of body, pump-out collector is placed in lower part of reactor. Quartz, silicon carbide and aluminium oxide are used in the capacity of dielectric materials of body, ladle, collectors, coats of butt lids and plates-simulators during process of treatment of silicon plates. EFFECT: simplified design, reduced cost of manufacture of silicon plates. 3 cl, 2 dwg