FIELD: microelectronics. SUBSTANCE: structure of former of image signals based on charged-coupled device has epitaxial layer of p type formed on substrate of n type. High-doped regions of n+ and p+ types of conductance are formed between epitaxial layer and substrate. n+ region is located under photodiode of n type and p+ region is arranged under charge-coupled device of n type. Specified regions are formed in substrate by ion implantation followed by thermal treatment before deposition of epitaxial layer of p type. EFFECT: improved quality of image thanks to reduced noise causing its blurring. 2 cl, 17 dwg
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Authors
Dates
1994-12-30—Published
1991-05-08—Filed