DEVICE FOR PULSE THERMAL TREATMENT OF SEMICONDUCTOR PLATES Russian patent published in 1995 - IPC

Abstract RU 2027255 C1

FIELD: microelectronics. SUBSTANCE: device has working chamber with set of tubular lamps, substrate holder, mechanism for transporting container together with cassettes, mechanism for transporting semiconductor plate into working chamber, two-side cleaning chamber disposed ahead the working chamber. Cleaning chamber has UV-radiation lamps, gas inlet-outlet valves, vacuum sealing disposed between the working chamber and cleaning chamber. Working chamber has quartz window and is equipped additionally with UV-radiation lamp provided with spherical reflector and vacuum valve. EFFECT: improved efficiency. 2 cl, 2 dwg

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RU 2 027 255 C1

Authors

Svetlichnyj A.M.

Sechenov D.A.

Poljakov V.V.

Dates

1995-01-20Published

1991-02-25Filed