KADMIKOM TARGET MANUFACTURING PROCESS Russian patent published in 1996 - IPC

FIELD: electronics. SUBSTANCE: glass substrate is produced for the target, heated to 500-550 C at a rate of 10-30 C/min, held for 5-20 min, treated in single step by ribbon electron beam moving at speed of 0.5-1.5 cm/s and having specific power of 5•10²-10⁴ W/cm², annealed at 500-550 C; signal plate is applied to glass substrate by cathodic-reactive deposition, glass substrate is treated in single step by ribbon electron beam moving at speed of 1-5 cm/s and having specific power of 0,5-0,1•10³ W/cm², n-type photosensitive layer is applied by vacuum and thermal deposition, sensitized, p-type photosensitive layer is applied by vacuum and thermal deposition, target is treated in single step by ribbon electron beam moving at speed of 1-10 cm/s and having specific power of 0,5-0,1•10³ W/cm²; shielding layer is applied by vacuum and thermal deposition. EFFECT: reduced smearing of target, improved sensitivity and yield of serviceable products. 2 dwg