FIELD-EFFECT TRANSISTOR Russian patent published in 1995 - IPC

Abstract RU 2029415 C1

FIELD: cryotronics. SUBSTANCE: field-effect transistor is formed on dielectric substrate. The latter bears buffer layer with conducting channel and gate made of insulating material. Metal electrode is provided for gate. Channel is made of superconducting material. Second buffer layer may be provided between channel and gate. EFFECT: improved design. 5 cl, 2 dwg

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RU 2 029 415 C1

Authors

Grekhov I.V.

Dates

1995-02-20Published

1992-04-06Filed