FIELD: chemical thermal treatment and strengthening metal covers deposition. SUBSTANCE: two-stage electrical arc discharge is exited between anode and cathode in vacuum chamber. Chamber walls serve directly as a mean to separate electrons from metal-gas stage of discharge plasma. Working surface of cathode in the case faces direction that is opposite to anode, that is to chamber wall. Treatment is exercised in gas stage of plasma, that enables to increase significantly quality of strengthening layer and carry out chemical-thermal treatment in series (for example, nitrating)) and application of surface cover during unified processing cycle. EFFECT: apparatus is used in chemical-thermal processes to strengthen surfaces by metal cover deposition. 6 cl, 3 dwg
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COATING APPLICATION UNIT | 1991 |
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DEVICE FOR HARD-FACING BY ION-PLASMA METHOD | 1992 |
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Authors
Dates
1995-06-19—Published
1992-02-18—Filed