FIELD: mechanical engineering. SUBSTANCE: inventionn refers to vacuum-plasma treatment of tools, parts of machines and other articles made from various materials. It has vacuum chamber divided into two symmetric spaces with the aid of partition attached to wall of chamber. Clearance communicating mentioned spaces is located between second end of partition and opposite wall of chamber. Anode and cathode of two-stage vacuum- arc discharge are positioned on wall of chamber on side of attached end of partition on both sides from it. In each space there are placed in parallel to partition sputtered electrodes displaced relative to symmetry axes of spaces to proper wall of chamber parallel to partition. Treated part mounted properly on holder can be used in the capacity of partition. Gived design approach makes it possible to create two opposite discharge currents flowing from anode to cathode. Currents directed in opposition create magnetic fields that deviate flux of electrons towards sputtered target (sputtered electrodes)increasing by this density of ion current on target and productivity of set accordingly. EFFECT: increased productivity of set. 5 cl, 4 dwg, 1 tbl
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Authors
Dates
1996-05-27—Published
1992-01-28—Filed