DEVICE FOR VACUUM-PLASMA WORKING GAS APPLICATION OF NONCONDUCTING COATINGS ON THE ARTICLES Russian patent published in 1995 - IPC

FIELD: vacuum-plasma processes. SUBSTANCE: space for formation of gas plasma is created in the vacuum chamber by means of mean impermeable for metal ions. Metal-gas plasma of cathode substance is generated between integrally cold cathode and anode of arc discharge. Gas plasma is then created in the above space, and the articles to be treated are submerged in the zone of metal-gas plasma between the gas plasma space and cathode. As a result, sections of the surface of device elements performing the function of anode and free of dielectric film of material deposited on the article exist in the zone of gas plasma in the course of the whole cycle of treatment. This allows variation of discharge parameters with respect to current and voltage to be eliminated in the course of treatment and quality of applied coating to be considerably increased. EFFECT: enhanced efficiency of application of non- conducting coatings. 3 cl, 2 dwg