DEVICE FOR HARD-FACING BY ION-PLASMA METHOD Russian patent published in 1994 - IPC

FIELD: vacuum-plasma machining of articles. SUBSTANCE: consumable element in installed in case of device and is manufactured in the form of parts electrically insulated from each other which are positioned on opposite sides of ion-impenetrable partition. One part of consumable element in connected to negative pole of low-voltage D.C. power supply source which positive pole is linked to anode and is cold cathode of vacuum arc discharge. The other part of consumable element is connected to sources of low and high voltages and can be ether cold cathode of vacuum arc discharge or sputtering target. Screen impenetrable to ions of metal is mounted above working surface of one of parts. Case is coupled to technological vacuum chamber. EFFECT: enhanced efficiency of hard-facing. 4 cl, 1 dwg