FIELD: vacuum deposition for obtaining coatings with amorphous and fine-crystalline structure without macroinclusions of substance evaporated in crucible. SUBSTANCE: method involves forming dependent discharge arc, whose cathodic spot is on surface of substance evaporated. Evaporation of high-melting point materials involves electron beam scanning. Apparatus has two positive electrodes embracing magnetic coils positioned in spaced relation to provide flowing of plasma. Diaphragm filters are fixed on electrode surfaces oriented one towards the other. Auxiliary electrode is positioned between evaporation chamber wall and substrate holder. EFFECT: increased efficiency and wider operational capabilities. 5 cl, 5 dwg, 2 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF COATING APPLICATION BY ELECTRON BEAM EVAPORATION IN VACUUM | 2012 |
|
RU2496912C1 |
| METHOD OF VACUUM ION-PLASMA LOW-TEMPERATURE DEPOSITION OF NONCRYSTALLINE COATING FROM ALUMINUM OXIDE | 2018 |
|
RU2676720C1 |
| METHODS USING REMOTE ARC DISCHARGE PLASMA | 2013 |
|
RU2640505C2 |
| LOW PRESSURE ARC PLASMA IMMERSION COATING VAPOUR DEPOSITION AND ION TREATMENT | 2014 |
|
RU2662912C2 |
| DEVICE FOR COATING SYNTHESIS | 2017 |
|
RU2657896C1 |
| PRODUCTION OF ELECTRIC-ARC PLASMA IN CURVILINEAR PLASMA GUIDE AND APPLICATION OF COATING ON SUPPORTING STRUCTURE | 1997 |
|
RU2173911C2 |
| PLASMA-IMMERSION ION TREATMENT AND DEPOSITION OF COATINGS FROM VAPOUR PHASE WITH HELP OF LOW-PRESSURE ARC DISCHARGE | 2014 |
|
RU2695685C2 |
| APPARATUS TO APPLY COATING IN VACUUM MEDIUM | 1990 |
|
RU1757249C |
| VACUUM COATING DEVICE | 0 |
|
SU1751224A1 |
| METHOD FOR DEPOSITING COMPOSITE COATINGS | 1998 |
|
RU2146724C1 |
