METHOD OF VACUUM ION-PLASMA LOW-TEMPERATURE DEPOSITION OF NONCRYSTALLINE COATING FROM ALUMINUM OXIDE Russian patent published in 2019 - IPC C23C14/24 

FIELD: technological processes.

SUBSTANCE: invention relates to ion-plasma low-temperature deposition of a nanocrystalline alumina coating on products. Melting and evaporation of aluminum in a low-pressure discharge plasma is carried out along with formation of a coating by deposition of a stream of plasma particles on the surface of the product in an oxygen environment under conditions of intense ion bombardment. Independent discharge with a self-hardening hollow cathode in an argon flow is used. Water-cooled crucible anode is placed inside a short magnetic coil. Evaporation of aluminum from the anode crucible is carried out by increasing the power density on the surface of the melt by passing a current through a magnetic coil. Adjust the rate of evaporation of aluminum from the crucible anode by changing the discharge current in the range of 10–40 A. Set the bias potential of products up to 200 V and supply oxygen. Form a nanocrystalline coating of aluminum oxide by precipitation of a stream of particles from a dense gas-metal plasma on the surface of the product.

EFFECT: improved coating quality is provided.

1 cl, 4 dwg, 1 ex