PLANT FOR DEPOSITION OF THIN DIELECTRIC FILMS Russian patent published in 1996 - IPC

Abstract RU 2062526 C1

FIELD: microelectronics. SUBSTANCE: in proposed plant working zone is fenced off with the use of two conductive gauze electrodes placed above or between treated samples. Grids in this case have same shape and dimension as substrate holders. EFFECT: facilitated manufacture. 2 dwg

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RU 2 062 526 C1

Authors

Rubtsov N.M.

Nagornyj S.S.

Dates

1996-06-20Published

1992-01-03Filed