FIELD: equipment for production of materials and semiconducting compounds. SUBSTANCE: source of working substance molecular flux has substance evaporator with heater, flux former with heater, control member and control member drive. Control member is made in the form of gate and is located inside canal connecting evaporator and former of flux. Gate overlapping canal surface is made at acute angle to canal axis and configuration of gate outer surface meets form of canal inner surface. Besides kinematic pairs, that provide gate motion, and connection with drive are made by flexible links. Equipment allows to adjust intensity and to shut molecular flux in spite of configuration of used former of flux under different consumption and modes of working substance vapor molecules current and without readjustment of source and deformation of directional pattern of flux coming out of former in process of adjustment. EFFECT: range of source operation temperature modes is expanded, structure is simplified with simultaneous prevention of working substance condensation on adjusting member and other members, that contact molecular flux. 1 cl, 5 dwg
