WAFER COATING DEVICE Russian patent published in 2003 - IPC

FIELD: manufacture of semiconductor devices; mechanical engineering. SUBSTANCE: device has drive table with wafer holding mechanism. Shielding housing is disposed in a spaced relation above drive table for vertical displacement and rotation coaxially to drive table and at same speed as the latter. This housing is made in the form of truncated cone with annular part on its large base, its small base being directed away from drive table. Shielding housing has intermediate chamber communicating with space between inner surface of housing and wafer being coated through concentric holes and with clean gas feeding line. Shielding housing also accommodates pressure sensor mounted on bottom edge of cone; it also has opening provided on its axis for drawing out photoresist feeding nozzle. EFFECT: reduced amount of polluting particles coming from surrounding atmosphere. 1 cl, 2 dwg