PHOTORESIST COATING DEVICE Russian patent published in 2010 - IPC H01L21/312 

FIELD: physics.

SUBSTANCE: device for depositing photoresist onto a substrate, which has a deposition chamber, a substrate holder with a rotary drive installed in a bath for depositing the photoresist, a unit for supplying photoresist with a batcher and a nozzle connected to the working container of photoresist, is also fitted with a unit for loading and unloading the working container of photoresist, a unit for loading and unloading substrates, a transporter with a substrate carrier mounted on a holder beam in the deposition chamber with possibility of vertical and horizontal displacement. The unit for loading and unloading the working container of photoresist has a housing with a top on which there is a cover and a movable platform for holding the container, which has internal cavities for filling with buffer liquid. In the wall of the cover there is a socket for a sensor for controlling the amount of photoresist in the working container and there is a photoresist inlet at the top of the housing.

EFFECT: improved quality of the deposited photoresist layer, broader functional capabilities of the device, increased reliability of the device and easier servicing.

5 cl, 15 dwg