FIELD: manufacturing of semiconductor crystals. SUBSTANCE: method involves laser-stimulated deposition of amorphous material from gas, generation of interference pattern using two laser beams in this layer, exposition of this film to laser beam which power provides possibility for its melding and starting crystallization process after this. Interference pattern (as standing wave) is used as seed for crystallization. EFFECT: increased functional capabilities. 2 cl
Authors
Dates
1997-12-10—Published
1996-07-10—Filed