FIELD: coatings. SUBSTANCE: method involves generation of plasma in vacuum chamber via evaporation of silicon-containing hydrocarbon caused by imposing high-frequency voltage on vacuum jig. Before the process, chamber is evacuated to pressure $$$ Torr. Thereafter, in order to provide stationary precipitation process and heating of ceramic inlet valve to feed silicon-containing hydrocarbon to 500-800 C, appropriate voltages are applied on hot cathode, anode, and vacuum jig; and argon is then fed into the chamber until steady burning of plasma is established. Burning is maintained for 5-10 min followed by introducing silicon-containing hydrocarbon. Its intake through ceramic inlet valve is gradually increased from 0 to specified value for 3-4 min and, when plasma current increases by 10-15%, feeding of argon is terminated. Invention can be used to form insulating, protective, and masking coatings in microelectronics and, in other technics area, to form mechanically strong and wear-resistant coatings. EFFECT: increased adhesion characteristics of coatings.
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Authors
Dates
1998-05-20—Published
1997-07-02—Filed