FIELD: semiconductor instruments. SUBSTANCE: method involves using photoresistor which is made from selenium-doped silicon for detection and measuring of infrared light flow by means of application of direct voltage to resistor contacts, its exposition to light and detection of signal from load resistor. Voltage to be applied is in range of 1,4•103d < U < 1,7•103d. In addition method involves measuring current oscillations frequency f at load resistor and calculation of infrared light flow Pi(W/cm2) using equation Pi= fU/b, where d is length of sample between contact regions (cm), b is constant for each photoresistor; it is calculated using said equation in said voltage range for at least one know value Pi. EFFECT: increased alternated photo signal which is proportional to infrared light without modulation of light. 1 tbl
Authors
Dates
1998-06-20—Published
1996-12-27—Filed