CHEMICAL SURFACE CLEANING UNIT FOR PARTS, PRIMARILY SEMICONDUCTOR PLATES Russian patent published in 1999 - IPC

Abstract RU 2139594 C1

FIELD: electronic engineering. SUBSTANCE: unit has liquid chemical cleaning system for plates, electrochemical cell for solution activation and cleaning built up of anode and cathode chambers separated by semi-transparent diaphragm, and system providing for continuous circulation of solution through unit systems that has pipelines, intermediate tanks, filters, pumps, shut-off and control valves. Cathode is provided with adsorber of cathode reaction products; anode chamber communicates with cathode chamber through tubular channel whose inlet is arranged level with sulfuric acid surface in cathode chamber and outlet is placed at bottom of anode chamber. EFFECT: improved cleaning effectiveness and activation of sulfuric acid solution. 3 cl, 2 dwg

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RU 2 139 594 C1

Authors

Khakhanina T.I.

Kljueva T.B.

Selivanova I.N.

Savel'Ev V.A.

Krasnikov G.Ja.

Kovalev A.A.

Dates

1999-10-10Published

1997-01-21Filed