FIELD: manufacture of sensitive elements of electrostatic gyroscopes. SUBSTANCE: continuous metal coat and photoresistive layer are deposited in turn on hemispherical surfaces of two dielectric hemispheres that form vacuum chamber of sensitive element. Luminous image is formed on photoresistive layer and specified pattern is generated by method of photolithography. Luminous image is formed from planar mask carrying pattern made in the form of conforming representation of specified pattern of electrode system on hemispherical surface. Photoresistive layer is exposed through planar mask in diverging coherent light beam emitted by point light source. In this case specified pattern is displayed on entire surface of hemisphere with solid wrapping angle of 180 deg in the form of real image of specified geometrical form and dimensions. EFFECT: possibility of winning pattern of any topology on entire internal hemispherical surface.
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Authors
Dates
1999-03-20—Published
1996-06-26—Filed