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2 129 294

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IPC

(21) (22)

Application

98109497/28, 1998-05-22

(22)

Actual filing date

1998-05-22

(45)

Published

1999-04-20

(72)

Inventor

Gurovich B.A.Dolgij D.I.Velikhov E.P.Kuleshova E.A.Aronzon B.A.Mejlikhov E.Z.Rjazantsev E.P.Ryl'Kov V.V.Prikhod'Ko K.E.Domantovskij A.G.Shtrombakh Ja.I.Ol'Shanskij E.D.

(73)

Holder

Gurovich Boris AronovichDolgij Dmitrij IosifovichVelikhov Evgenij PavlovichKuleshova Evgenija Anatol'EvnaAronzon Boris AronovichMejlikhov Evgenij ZalmanovichRjazantsev Evgenij PetrovichRyl'Kov Vladimir Vasil'EvichPrikhod'Ko Kirill Evgen'EvichDomantovskij Aleksandr Grigor'EvichShtrombakh Jaroslav IgorevichOl'Shanskij Evgenij Dmitrievich

PROCESS OF PATTERN MANUFACTURE Russian patent published in 1999 - IPC

Abstract RU 2129294 C1

FIELD: technology of creation of patterns with the use of charged particle. SUBSTANCE: invention can be used for manufacture of various electron devices, storages, etc having complex structures and composed of assemblage of supersmall elements. Process of pattern manufacture includes transmission of beam of charged particles through mask and its subsequent focusing on to irradiated surface. In this case beam directed on to mask is formed with spread of 10^-2 rad and dispersion of charged particles by energies in beam equal to 0.1-5.0 eV. EFFECT: enhanced resolution and possibility of manufacture of individual elements of pattern with geometrical dimensions in the order of several nanometers. 1 dwg, 2 tbl

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RU 2 129 294 C1

Authors

Gurovich B.A.

Dolgij D.I.

Velikhov E.P.

Kuleshova E.A.

Aronzon B.A.

Mejlikhov E.Z.

Rjazantsev E.P.

Ryl'Kov V.V.

Prikhod'Ko K.E.

Domantovskij A.G.

Shtrombakh Ja.I.

Ol'Shanskij E.D.

Dates

1999-04-20—Published

1998-05-22—Filed