MAGNETRON SPRAYING SYSTEM Russian patent published in 2003 - IPC

FIELD: plasma technique; application of metal films. SUBSTANCE: proposed magnetron spraying system includes target, magnetic unit and hollow anode connected with gas supply system and made in form of closed loop with injection holes over entire length which are directed to center of magnetron discharge. Loop is located above surface of target at distance comparable with length of free path of sprayed particles. Such construction makes it possible to reduce pressure of working gas in main volume of vacuum chamber without impairment of parameters of magnetron discharge and process of spraying and to select optimal conditions of burning of discharge by smooth change of distance between cathode and anode. EFFECT: enhanced efficiency. 2 cl, 1 dwg