FIELD: nonferrous metallurgy, particularly, methods and devices for production of chlorides of refractory metals by chlorination in chlorine salts melt. SUBSTANCE: method includes chlorination by charging of melt of alkali metal chlorides, raw materials and reducing agent onto surface of melt of alkali metals chlorides with simultaneous supply of chlorine and conduction of chlorination process to produce vapor-gas mixture; treatment of mixture with pulp of titanium tetrachloride above level of chlorides melt; discharge of spent melt and precipitation of solid chlorides and dust from vapor-gas mixture of melt of alkali metal chlorides; supply of vapor-gas mixture and its treatment with gas-melt mixture which is sprayed above melt with help of inert gas. Chlorination and precipitation and conducted in chambers communicating by melt, with maintenance of melt constant level during the entire process of chlorination and precipitation with simultaneous treatment of vapor-gas mixture with pup of titanium tetrachloride. Device for production of refractory metal chlorides ahs chlorination chamber with lining, bottom, tuyere for chlorine supply of charge, branch pipe for supply of pulp of titanium tetrachloride, branch pipe for discharge of vapor-gas mixture taphole for discharge of spent melt; chamber for metal chloride precipitation made with lining, bottom, branch pipes for supply and discharge of vapor-gas mixture, gas lift with pipe for discharge of inert gas, two-way hollow stand pipes and inert gas source. Chlorination and chloride precipitation chambers are combined by common bottom with inclination toward chlorination chamber and have opening for melt circulation. Gas lifts are located in lining of precipitation chamber from opposite sides and made in form of two pipes. One pie for introduction of inert gas is connected from a top with inert gas source, its lower end is bend and located against the other pipe for raising the gas-melt mixture. EFFECT: higher degree of raw material utilization and purification of vapor gas mixture. 11 cl, 3 dwg
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Authors
Dates
2001-08-27—Published
2000-03-30—Filed