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2 098 512

(13)

C1

(51)

IPC

(21) (22)

Application

96110833/02, 1996-05-29

(22)

Actual filing date

1996-05-29

(45)

Published

1997-12-10

(72)

Inventor

Abramov I.S.Bystrov Ju.A.Lisenkov A.A.

(73)

Holder

Sankt-Peterburgskij Gosudarstvennyj Ehlektrotekhnicheskij Universitet

VACUUM-ARC PLASMA SOURCE Russian patent published in 1997 - IPC

Abstract RU 2098512 C1

FIELD: plasma technology. SUBSTANCE: vacuum-arc plasma source has elongated cylindrical cathode, extended magnetic system, blowout screen, igniting electrode and anode fitted with extended magnetic system made in the form of spiral mounted uniaxially to cathode which turns embrace its working surface. One of leads-in of magnetic system is connected to positive pole of power supply source of arc discharge and the other one is grounded. EFFECT: enhanced efficiency and stability of source. 2 dwg

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RU 2 098 512 C1

Authors

Abramov I.S.

Bystrov Ju.A.

Lisenkov A.A.

Dates

1997-12-10—Published

1996-05-29—Filed

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